Dresden 2009 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

O: Fachverband Oberflächenphysik

O 66: Organic, polymeric, biomolecular films – also with absorbates II

O 66.3: Vortrag

Freitag, 27. März 2009, 11:45–12:00, SCH A316

Laser-assisted chemical lithography via local photothermal functionalization of silane-based organic monolayers — •Benjamin Klingebiel, Anja Schröter, and Nils Hartmann — Fachbereich Chemie, Universität Duisburg-Essen (UDE) and Center for Nanointegration Duisburg-Essen (CeNIDE), Universitätsstraße 5, 45117 Essen

Photochemical routines are widely recognized as a versatile means to fabricate multifunctional patterned organic monolayers with laterally alternating chemical terminations. The lateral resolution, in turn, usually is limited to the micrometer and submicrometer length scales. A simple routine for nanopatterning of organic monolayers down to 100 nm and below relies on photothermal processes [1, 2]. For this purpose a focused laser beam is used to locally heat the substrate and initiate thermal decomposition of the monolayer. Here we report on a simple photothermal procedure for direct functionalization of organic monolayers. Surface-oxidized silicon samples are coated with alkylsiloxane monolayers. Local irradiation with a focused beam of an argon ion laser at a wavelength of 514 nm in gaseous bromine allows for direct functionalization of the monolayer. Mechanistic aspects and prospects of photothermal routines in micro- and nanofabrication of multifunctional organic monolayers are discussed.

1. D. Dahlhaus, S. Franzka, E. Hasselbrink, N. Hartmann, Nano Lett. 6 (2006) 2358.

2. N. Hartmann, B. Klingebiel, T. Balgar, S. Franzka, E. Hasselbrink, Appl. Phys. A 94 (2009) 95.