Dresden 2009 – wissenschaftliches Programm

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SYSO: Symposium Self-organizing Surfaces and Interfaces

SYSO 3: Self-Organizing Surfaces and Interfaces - Posters

SYSO 3.18: Poster

Mittwoch, 25. März 2009, 17:30–19:30, P3

Probing the elastic properties of individual nanostructures by combining in-situ AFM and micro X-ray Diffraction — •Till H. Metzger¹, Thomas Scheler¹, Thomas Cornelius¹, Rogerio Paniago¹, Mario Rodrigues², Crsitian Mocuta¹, Angelo Malachias¹, Joel Chevrier², and Fabio Comin¹ — ¹European Synchrotron Radiation Facility (ESRF), B.P. 220, 38043 Grenoble Cedex, France — ²Institut Néel, CNRS-UJF, B.P. 166, 38042 Grenoble Cedex 9, Frane

Atomic Force Microscopy (AFM) and micro X-ray Diffraction ( micro-XRD) are combined to investigate nanostructures during in-situ indentation. This technique allows the determination of elastic properties of individual nanoscale objects, particularly here SiGe/Si(001) self-assembled islands. Using this novel technique it was possible to select a specific island, align it in the microfocused beam and apply a pressure onto it,using the AFM tip. Simultaneously, the X-ray diffuse scattering map from the island and the surrounding substrate was recorded in order to probe the lattice parameter change during indentation. An elastic reduction of the island lattice parameter of up to 0.6% was achieved.