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P: Fachverband Plasmaphysik
P 10: Poster: Plasmatechnologie
P 10.13: Poster
Dienstag, 31. März 2009, 17:30–19:30, Foyer des IfP
Comparative chemical reaction studies of CH4/Ar, C2H4/Ar and C2H6/Ar gas mixture dielectric barrier discharge plasma: mass spectrometrical analysis — •Abhijit Majumdar, Tin Maung Tun, and Rainer Hippler — Institute of Physics, Ernst-Moritz-Arndt-University Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany
Chemical reactions in dielectric barrier discharge at medium pressure of 300 mbar have been studied in CH4/Ar, C2H4/Ar, and C2H6/Ar gas mixtures by means of mass spectrometry. The main reaction scheme in CH4/Ar is production of H2 by fragmentation of CH4, but production of higher order hydrocarbon molecules such as CnHm with n up to 9 including formation of different functional CN groups is also observed. Formation and fragmentation of C2H2, C2H4, and C2H6 molecules has been investigated in some detail. Significant differences are noted in comparison to a theoretical estimate.