Hamburg 2009 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

Q: Fachverband Quantenoptik und Photonik

Q 62: Photonik II

Q 62.8: Talk

Friday, March 6, 2009, 15:45–16:00, Audi-A

Optical characterization of photosensitive organic materials for photonic systems — •Soner Emec, Timo Feid, Sven Frohmann, Christian Müller, and Susanna Orlic — Optical Technologies Lab, Technische Universität Berlin, Germany

Diffractive optical elements with application specific tailored properties can be fabricated by light induced alternation of the material*s refractive index. Holographic polymers or photoresists are typically used for permanent optical structurization. Today photostructurable media become core elements of photonic systems with innovative capabilities. We investigate different classes of organic photosensitive materials in order to optimize the interaction between the material and an optoelectronic system around. Some exemplary applications are microholographic data storage, 3D nano/micro structuring, and optical patterning for advanced security features. Key issues include dynamic material response, spectral and temporal grating development, influence of the light intensity distribution, effects of pre-exposure and post-curing, etc. Materials under investigation are cationic and free radical polymerization systems, liquid crystalline polymer nanocomposites, and photoresist systems.