Hannover 2010 – scientific programme
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Q: Fachverband Quantenoptik und Photonik
Q 21: Poster I
Q 21.88: Poster
Tuesday, March 9, 2010, 16:00–19:00, Lichthof
Fabrication of Bragg Gratings for Silicon-on-Insulator Waveguides — •Harald Richter1, David Stolarek1, Lars Zimmermann1,2, Joachim Bauer1, Steffen Marschmeyer1, Ivano Giuntoni2, Andrzej Gajda2, and Bernd Tillack1,2 — 1IHP Frankfurt, Im Technologiepark 25, 15236 Frankfurt (Oder) — 2Technische Universität Berlin, HFT 4, Einsteinufer 25, 10587 Berlin
Bragg gratings established in the last years as an important waveguide component for achieving wavelength selective filter functions. Fiber based Bragg grating structures can be considered state of the art for applications in the optical communications and for sensing. The implementation of such components on silicon waveguides is highly desirable, to permit the realization of integrated resonators and optical filters for wavelength selection or for dispersion compensation. We present a wafer level technology based on deep ultra-violet (DUV) lithography to fabricate Bragg gratings on Silicon-on-insulator (SOI) rib waveguides. The principle of the used double patterning technique is presented, as well the influence of the process variations on the device performances. Usable structures were realized, exhibiting a small overlay error and non-rectangular grating profile. The optical characterization showed that the presented technique is capable to provide gratings with performance comparable to state of the art gratings patterned with electron-beam lithography.