Hannover 2010 – wissenschaftliches Programm

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Q: Fachverband Quantenoptik und Photonik

Q 64: Matterwave Optics II

Q 64.7: Vortrag

Freitag, 12. März 2010, 15:30–15:45, A 320

Quantum interference lithography with large molecules — •Philipp Geyer, Thomas Juffmann, Stefan Truppe, Sarayut Deachapunya, Andras Major, Hendrik Ulbricht, and Markus Arndt — University of Vienna Austria

Already in the past, Talbot-Lau interferometry had proven to be a suitable tool for testing the wave-particle duality of complex and massive molecules.

We here report the implementation of a new detection scheme for molecule interferometry: the near-field interference pattern is deposited onto an atomically clean Si(111)7x7 surface, immobilized and subsequently imaged using a scanning tunnelling microscope (STM). We present interferograms of C60 buckyballs written onto the reconstructed silicon surface. STM imaging allows to detect every single molecule with nanometer resolution within the interference pattern. Dominantly applied as a detecting tool in quantum interference experiments molecule lithography also opens an interesting perspective on soft and non-contact surface deposition of molecular nanopatterns.