Regensburg 2010 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 10: Poster: Structure and Dynamics of Responsive Hydrogels

CPP 10.9: Poster

Montag, 22. März 2010, 16:30–18:00, Poster C

Environment-friendly photolithography using poly-(N-isopropylacrylamide)-based thermoresponsive photoresists — •Leonid Ionov¹, Nikolay Puretskiy¹, Georgi Stoychev¹, Svetlana Zakharchenko¹, Stefan Diez², and Manfred Stamm¹ — ¹Leibniz-Institut fuer Polymerforschung Dresden e.V., Dresden, Germany — ²Max-Planck-Institute of Molecular Cell Biology and Genetics, Dresden, Germany

We report a novel approach for the temperature-triggered development of water-soluble photoresists based on photocleavable poly-(N-isopropylacrylamide) copolymers. These copolymers are soluble in aqueous environment below their Lower Critical Solution Temperature (LCST). Upon UV irradiation, the photocleavable groups are deprotected resulting in an increased LCST. Thus, the illuminated parts of spin-coated copolymer layers dissolve at higher temperatures than the surrounding areas, leading to pattern development. The photoresist can finally be completely removed at low temperature. We demonstrate the applicability of this novel photolithographic approach by the patterning of fluorescent proteins.