Regensburg 2010 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 14: Poster: Interfaces and Thin Films

CPP 14.23: Poster

Monday, March 22, 2010, 16:30–18:00, Poster C

Self-Alignment of Block Copolymers on Chemically Patterned Substrates — •Tobias Heiler¹, Roland Gröger¹, Stefan Walheim¹, and Thomas Schimmel^1,2 — ¹Institute of Nanotechnology (INT), Northern Campus, Karlsruhe Institute of Technology (KIT) — ²Institute of Applied Physics, Southern Campus, Karlsruhe Institute of Technology (KIT)

Chemical patterns were made by nanoshaving polymer brush layers on silicon oxide. The contrast in polarity between brush surface and exposed silicon oxide was used to control the phase morphology of an amphiphilic block copolymer film. The two components of the block copolymer, as well as the surface of the chemically patterned substrate possess a high contrast in polarity, so that a defect tolerant pattern replication in the polymer film is observed after a short (vapor-)annealing process. Polybutadiene-based block copolymers and polystyrene brushes were used.