Parts | Days | Selection | Search | Downloads | Help
CPP: Fachverband Chemische Physik und Polymerphysik
CPP 18: Interfaces and Thin Films II
CPP 18.2: Talk
Tuesday, March 23, 2010, 14:15–14:30, H39
Formation of lateral structures in thin diblock copolymer films by vapor treatment — Alessandro Sepe1, Peter Cernoch2, Petr Stepanek2, Detlef-M. Smilgies3, Stephan V. Roth4, Andreas Timmann4, and •Christine M. Papadakis1 — 1TU München, Physikdepartment E13, Garching — 2Inst. Macromolecular Chemistry, Prague, Czech Republic — 3Cornell University, Ithaca NY, USA — 4HASYLAB at DESY, Hamburg
Exposure of block copolymer thin films to solvent vapor allows to control the orientation of the mesostructure with respect to the film surface. Using real-time, in situ grazing-incidence small-angle X-ray scattering (GISAXS), we have investigated the structural changes in thin films of lamellae-forming poly(4-octylstyrene-b-butylmethacrylate) [1] during exposure to hexane and cyclohexane vapor.
We have varied the initial film thickness and have found that, in all cases, a lateral structure is created. However, both, the kinetics of structure creation and the final repeat distance depend strongly on the film thickness and on the solvent chosen. Instabilities are observed during the first few minutes of vapor exposure in the thicker films, whereas the behaviour is continuous in the thinner film.
1. P. Cernoch, P. Stepanek et al., Eur. Poly. J. 43, 1144 (2007)