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Regensburg 2010 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 30: Poster: Micro and Nanofluidics

CPP 30.3: Poster

Wednesday, March 24, 2010, 17:30–19:00, Poster C

Wetting of hydrophobic periodic nanotemplates on Si-surfaces — •Stefan Wiedemann1, Stefan Heindl1, Kay Egloff2, Alfred Plettl1, Sabine Hild3, and Paul Ziemann11Institut für Festkörperphysik, Universität Ulm, 89069 Ulm, Germany — 2Institut für Experimentelle Physik, Universität Ulm, 89069 Ulm, Germany — 3Institut für Polymerwissenschaften, Universität Linz, A-4040 Linz, Austria

To influence the wetting behavior of a Si surface, periodically ordered nanomasks were prepared by a micellar[1] and photoseeding technique and used to fabricate extended arrays of nanopillars on a Si wafer by RIE etching[3]. These methods allow a systematic variation of the height (<180nm), density (70-500 1/µ m2) and diameter (10-40nm) of the pillars. After removing the etching mask hydrophobicity of the samples was additionaly modified by coating with HMDS (Hexamethyldisilane), OTMS (Octadecyltrimethoxysilane) or a fluorcarbonfilm fabricated by plasma-deposition. Wetting of water was studied by measuring advancing, static and receeding contact angles. First results demonstrate either the Wenzel or Cassie-Baxter-state of water drops on the nanostructured surfaces.

[1] G. Kästle et al., Adv. Funct. Mat. 13, 853 (2003)

[2] A. Seidenstücker et al., submitted

[3] F. Weigl et al., Diamond and rel. Mat. 15 1689 (2006)

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