Regensburg 2010 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 4: Focus: Structure and Dynamics of Responsive Hydrogels II

CPP 4.5: Talk

Monday, March 22, 2010, 15:15–15:30, H37

Crosslinking and Patterning of Sensitive Polymers with Electron Beam Lithography: Sensoric Application — •Claudia Kaiser¹, Ingolf Moench², and Karl-Friedrich Arndt¹ — ¹Physical Chemistry of Polymers, Department of Chemistry, TU Dresden, 01062 Dresden, Germany — ²Leibniz-Institute for Solid State and Materials Research Dresden, Germany

Sensitive hydrogels provide an excellent basis for various industrial applications due to their ability to change conformation in response to even a little change in environmental conditions (e.g. temperature, concentration of a second component or pH). Examples are optoelectronics, fluidics or pharmaceutics. A further possibility offers the integration in sensor systems. Miniaturization of hydrogel patterns is a basic requirement for application in microsystems. Thus, latest researches are engaged in the synthesis and characterization of hydrogel structures in the μm and 100 nm scale. The aim of our work is to give an overview about the possibilities to pattern several stimuli-sensitive polymers with electron beam lithography. We present results concerning synthesis, structuring parameters, attained dimensions, and the retained sensitivity by measuring property changes. To show the variability of the technique we investigate the polymers hydroxypropylcellulose, PNIPAM, P4VP, pluronic F127, and PVA/PAA-blend. For different application, e.g. to monitor the swelling-/deswelling-process by measurement of corresponding signals it could be useful to functionalize the polymer layer by filling. Therefore, the polymer layers become filled with different nanoparticles.