Regensburg 2010 – wissenschaftliches Programm

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DF: Fachverband Dielektrische Festkörper

DF 3: Poster I: Nano- and microstructured dielectrics, surfaces and interfaces, dielectric composites

DF 3.4: Poster

Montag, 22. März 2010, 15:00–17:30, Poster D1

Ferroelectric lithography: The promising route for assembling metallic and molecular nanostructures — •Alexander Haußmann, Mathias Schröder, and Lukas M. Eng — Institut für Angewandte Photophysik, Technische Universität Dresden, D-01062 Dresden

The presence of different surface charges and thus different surface reactivities offers the possibility of exploiting domain-structured ferroelectrics as templates for assembling various functional nanostructures. This technique is claimed ferroelectric lithography [1], bearing the power for the controlled bottom-up assembly and integration of dissimilar species over large sample areas.

Here, we report on both the assembly and characterization of noble-metallic and molecular nanowires that were deposited photochemically at 180^∘ domain walls on 5 mol% Mg-doped congruent LiNbO₃ single crystal templates [2]. By using different AFM techniques, the domain wall decoration was analyzed in detail with respect to the underlying domain structure (imaged by piezoresponse force microscopy, PFM). Furthermore, a promising explanation of this effect due to UV-induced domain wall conductivity will be discussed.

[1] S.V. Kalinin et al., Nano Letters 2, 589 (2002).

[2] A. Haussmann et al., Nano Letters 9, 763 (2009).