Regensburg 2010 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 19: Synthesis of Nanostructured Films by Self-organization I (Focused Session)

DS 19.3: Vortrag

Mittwoch, 24. März 2010, 11:15–11:30, H2

Self-organized pattern formation on Si by low-energy ion beam erosion with simultaneous Fe incorporation — •Marina Cornejo, Bashkim Ziberi, Frank Frost, and Bernd Rauschenbach — Leibniz-Institut ür Oberflächenmodifizierung (IOM), Permoserstrasse 15, D-04318 Leipzig, Germany

A simple bottom-up approach for the generation of nanostructures on solid surfaces is the low energy ion beam erosion. Under certain sputtering conditions and despite the random nature of the ion bombardment, well ordered nanostructures, like one-dimensional ripples or regular arrays of dots, can be formed by self-organization processes. In the last years, the focus of our group has been the pattern formation by low-energy ion beam erosion, especially the correlation between the experimental parameters and the resulting topography. In this contribution the role of the substrate contamination is introduced. In particular, the incorporation of Fe and its relation with the experimental parameters and the topography evolution on Si was analyzed. For this study a Kaufman-type broad beam source was used. It is shown that with increasing divergence of the ion beam, the concentration Fe found on the Si surface increases and this strongly affects the pattern formation under near normal ion incidence conditions. The Fe originates from an enhanced sputtering of parts of the vacuum chamber. In addition, it is also demonstrated that the steady state concentration of Fe depends on the ion incidence angle. This can be explained by different angular dependence of the sputter yields of Fe and Si, respectively.