Regensburg 2010 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 2: Nanophotonics - Devices II (Focused Session together with HL)

DS 2.1: Topical Talk

Montag, 22. März 2010, 14:00–14:30, H2

High performance lasers realised by advanced nanofabrication technologies — •Johann Peter Reithmaier — Institute of Nanostructure Technologies and Analytics, Kassel, Germany

With advanced nanofabrication techniques beyond conventional semiconductor fabrication technologies, one has access to more independent parameters for the optimization of the device performance or the fabrication process itself. Two major nanostructure technologies will be addressed in this talk. One is based on self-organized growth of quantum dot materials with new formation techniques and structure designs, which are used for the realization of temperature stable high power lasers. Recent device results, e.g. based on tunnel-injection structures, and the realization of coolerless pump modules will be discussed. The second technique is based on nanolithography and high aspect ratio dry-etching, which allows the fabrication of surface defined gratings for high-speed multi-section DFB and DBR lasers. Recent results of such devices fabricated with this low-cost nanoimprint compatible fabrication technology will be presented. The work was mainly performed in the frame of two European projects (Brighter, DeLight).