DS 25: Application of Thin Films
Mittwoch, 24. März 2010, 16:00–17:00, H8
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16:00 |
DS 25.1 |
Development of Multilayer Laue Lenses for soft X-ray radiation — •Tobias Liese, Hans-Ulrich Krebs, Michael Reese, Peter Großmann, and Klaus Mann
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16:15 |
DS 25.2 |
AlN-basierte Mikrogeneratoren — •Oliver Bludau, Claus-Christian Röhlig, Lutz Kirste, Ram Ekwal Sah, Rachid Driad, Vadim Lebedev, Volker Cimalla, Christoph Nebel und Oliver Ambacher
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16:30 |
DS 25.3 |
Aluminum Nitride and Nanodiamond Thin Film Microstructures — •Fabian Knöbber, Oliver Bludau, Claus-Christian Röhlig, Oliver Williams, Ram Ekwal Sah, Lutz Kirste, Volker Cimalla, Vadim Lebedev, Christoph Nebel, and Oliver Ambacher
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16:45 |
DS 25.4 |
Single Ion Lithography — •Hans-Gregor Gehrke, Anne-Katrin Nix, Johann Krauser, Christina Trautmann, Alois Weidinger, and Hans Hofsäss
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