Regensburg 2010 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 25: Application of Thin Films

DS 25.3: Vortrag

Mittwoch, 24. März 2010, 16:30–16:45, H8

Aluminum Nitride and Nanodiamond Thin Film Microstructures — •Fabian Knöbber, Oliver Bludau, Claus-Christian Röhlig, Oliver Williams, Ram Ekwal Sah, Lutz Kirste, Volker Cimalla, Vadim Lebedev, Christoph Nebel, and Oliver Ambacher — Fraunhofer-Institute for Applied Solid State Physics, Freiburg, Germany

In this work, aluminum nitride (AlN) and nanocrystalline diamond (NCD) thin film microstructures have been developed. Freestanding NCD membranes were coated with a piezoelectrical AlN layer in order to build tunable micro-lens arrays. For the evaluation of the single material quality, AlN and NCD thin films on silicon substrates were fabricated using RF magnetron sputtering and microwave chemical vapor deposition techniques, respectively. The crystal quality of AlN was investigated by X-ray diffraction. The piezoelectric constant d₃₃ was determined by scanning laser vibrometry. The NCD thin films were optimized with respect to surface roughness, mechanical stability, intrinsic stress and transparency. To determine the mechanical properties of the materials, both, micromechanical resonator and membrane structures were fabricated and measured by magnetomotive resonant frequency spectroscopy and bulging experiments, respectively. Finally, the behavior of AlN/NCD heterostructures was modeled using the finite element method and the first structures were characterized by piezoelectrical measurements.