Regensburg 2010 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 28: [O] Plasmonics and Nanooptics IV (Joint Session DS/O/HL)

DS 28.7: Vortrag

Mittwoch, 24. März 2010, 16:30–16:45, H32

Nanosphere Lithography of Sub-50 nm Plasmonic Structures — •Jun Zhao, Bettina Frank, and Harald Giessen — Universität Stuttgart, Deutschland

Nanosphere lithography is a powerful and fast fabrication technique for periodic large-area metallic nanostructures of different and complex shapes [1]. We use tilted-angle-rotation thermal evaporation onto the monolayers of close-packed polystyrene nanospheres to fabricate metamaterial samples of up to 1 cm².

With this fabrication technique we can prepare sub-50 nm plasmonic structures such as pentamers, hexamers, and also ring structures with a centered or off-centered disk in the middle, which is useful for investigation of Fano-type plasmon resonances and future sensors.

The optical response of our structures was measured in reflectance geometry with FTIR-microscopy. The measurements show good agreement with our simulations. We also performed stacking experiments of split-ring resonators, which can be arranged in an ordered or twisted stereometamaterial fashion [2].

[1] . M. C. Gwinner, E. Koroknay, L. Fu, P. Patoka, W. Kandulski, M. Giersig, and H. Giessen, Small 5, 400 (2009) [2]. N. Liu, H. Liu, S. Zhu, and H. Giessen, Nature Photonics 3, 157 (2009)