Regensburg 2010 – scientific programme

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DS: Fachverband Dünne Schichten

DS 29: Poster: Molecular Spintronics, Biomolecular and Functional Organic Layers, Organic Electronics and Photovoltaics, Plasmonics and Nanophotonics, Organic Thin Films, Nanoengineered Thin Films, Thin Film Characterisation,

DS 29.51: Poster

Wednesday, March 24, 2010, 15:00–17:30, Poster A

Organic molecular beam deposition of organic radicals — •Sabine-A. Savu¹, Indro Biswas¹, Donella Rovai², Lorenzo Sorace², Matteo Mannini², Andrea Caneschi², Antje Vollmer³, M. Benedetta Casu¹, and Thomas Chassé¹ — ¹IPTC, University of Tübingen, Tübingen, Germany — ²LAMM, University of Florence, Italy — ³Helmholtz-Zentrum Berlin, BESSY, Berlin, Germany

Nitronyl nitroxide radicals are a class of paramagnetic compounds that are of interest not only because of their magnetic properties but also because of their use as a building block in more complex magnetic structures. A crucial aspect is the possibility to grow thin films, down to the submonolayer regime, investigating their chemical, physical, and morphological properties. In this work we present X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and NEXAFS (Near Edge X-ray Absorption Fine Structure), of thin films of a pyrene derivative of the nitronyl nitroxide radical (nitpyrene). Nitpyrene was deposited under ultra high vacuum conditions onto the well characterized single crystal Au(111) surface, using strictly controlled evaporation conditions. The electronic structure and the interaction with the surface are discussed. By analyzing the attenuation of the XPS substrate signal, we find indications for a Stranski-Krastanov growth mode, supported by AFM measurements showing a distinctive island formation under this preparation conditions. The persistence of the paramagnetic character of the molecules has been probed by EPR measurements.