Regensburg 2010 – scientific programme

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DS: Fachverband Dünne Schichten

DS 35: Biomolecular and Functional Organic Layers I (Focused Session)

DS 35.2: Talk

Thursday, March 25, 2010, 17:45–18:00, H2

Optical Characterization of Cytosine Thin Films — •Dana M. Rosu, Simona Pop, Norbert Esser, and Karsten Hinrichs — ISAS - Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Str. 9, 12489 Berlin, Germany

Due to their application in the fabrication of biomolecular electronic devices, the cytosine thin films are of high technological interest. Therefore, the understanding of the optical and structural properties of these films is important for the controlled design of cytosine thin films. In the present work, results of a complex study on thin films of cytosine on Si with a thickness between 10 nm and 125 nm are presented. The thin films were obtained by evaporation in high vacuum and investigated using different optical techniques. Thickness and dielectric function of the cytosine films were determined from VIS ellipsometric measurements while molecular orientation was studied by IR ellipsometry and reflectance anisotropy spectroscopy (RAS). Different organization of the molecules on the substrate is observed for different film thicknesses. The IR mapping ellipsometer [1], located at the BESSY II synchrotron facility was used in order to study the structural and thickness homogeneity of the samples.

References: [1]Gensch M., Esser N., Korte E. H., Schade U., Hinrichs K. Infrared Physics and Technology 2006, 49, 74