Regensburg 2010 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 36: Thin Film Characterisation: Structure Analyse and Composition (XRD, TEM, XPS, SIMS, RBS, ...) I

DS 36.5: Vortrag

Donnerstag, 25. März 2010, 10:30–10:45, H8

A New High-Resolution Scanning Electron Microscope for the in-situ investigation of ion beam modifications of solid surfaces — •Wolfgang Bolse¹, Sankarakumar Amirthapnadian^1,2, and Florian Schuchart¹ — ¹Institut für Halbleiteroptik und Funkitonelle Grenzflächen, Universität Stuttgart — ²on leave from: IGCAR, Kalpakkam, India

A High Resolution Scanning Electron Microscope (HRSEM), which allows for in-situ investigation of swift heavy ion (SHI) induced modifications of solid surfaces with nm resolution, has been installed at the M-branch of the UNILAC ion accelerator at GSI in Darmstadt. The HRSEM is a standard SUPRA-40 SEM by CARL ZEISS SMT with an annular in-lens secondary electron detector, an Everhart-Thornley scintillation detector and a retractable 4-quadrant Si-diode with a hole in the center. Two ports of the microscope chamber have been modified such that it could be integrated into the UNILAC beam line and the ion beam can pass through the focal zone of the upright electron lens. In addition to the standard eucentric stage, a special stage was designed which allows to continuously vary the tilt angle of the sample from normal incidence of the electron beam to normal incidence of the ion beam, as well as for continuous azimuthal rotation of the sample. In this report we will introduce the setup and discuss why in-situ investigation of structure formation under SHI bombardment outmatches conventional ex-situ experiments. We will demonstrate the potential of the instrument by presenting the results of our first in-situ experiments on SHI induced dewetting of thin oxide films.