Regensburg 2010 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Biomolecular and Functional Organic Layers II (Focused Session)
DS 43.5: Vortrag
Freitag, 26. März 2010, 12:45–13:00, H2
Environment-friendly photolithography using poly-(N-isopropylacrylamide)-based thermoresponsive photoresists — •Leonid Ionov1, Nikolay Puretskiy1, Georgy Stoychev1, Svetlana Zakharchenko1, Stefan Diez2, and Manfred Stamm1 — 1Leibniz-Institut fuer Polymerforschung Dresden e.V., Dresden, Germany — 2Max-Planck-Institute of Molecular Cell Biology and Genetics, Dresden, Germany
We report a novel approach for the temperature-triggered development of water-soluble photoresists based on photocleavable poly-(N-isopropylacrylamide) copolymers. These copolymers are soluble in aqueous environment below their Lower Critical Solution Temperature (LCST). Upon UV irradiation, the photocleavable groups are deprotected resulting in an increased LCST. Thus, the illuminated parts of spin-coated copolymer layers dissolve at higher temperatures than the surrounding areas, leading to pattern development. The photoresist can finally be completely removed at low temperature. We demonstrate the applicability of this novel photolithographic approach by the patterning of fluorescent proteins.