Regensburg 2010 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 46: Organic Thin Films III

DS 46.9: Vortrag

Freitag, 26. März 2010, 16:00–16:15, H8

Direct Write 3-Dimensional Nanopatterning using Probes — •Felix Holzner¹, Armin Knoll¹, David Pires¹, Ute Drechsler¹, Michel Despont¹, Heiko Wolf¹, James Hedrick², Anuja DeSilva³, and Urs Duerig¹ — ¹IBM Research - Zurich, Switzerland — ²IBM Research - Almaden, USA — ³IBM Research - Watson, USA

A high-resolution probe based patterning method is presented using organic resists, that respond to the presence of a hot tip by local material desorption. Thereby arbitrarily shaped patterns can be written in the organic films in the form of a topographic relief. Line gratings with a half-pitch of 15 nm have been fabricated.

Moreover, three dimensional patterns can be written by controlling the amount of material removal. The patterns can be readily transferred into silicon using standard RIE technology. The new technique offers a cost-effective and competitive alternative to high-resolution electron-beam lithography in terms of both resolution and speed.