Regensburg 2010 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

DS: Fachverband Dünne Schichten

DS 9: Poster: Synthesis of Nanostructured Films by Self-organization, Thermoelectric Thin Films and Nanostructures, High-k and Low-k Dielectrics, Layer Deposition Processes, Layer Growth, Layer Properties, Application of Thin Films, Surface Modification, Hard and Superhard Coatings, Metal Layers

DS 9.19: Poster

Monday, March 22, 2010, 15:00–17:30, Poster D1

Investigation of the electrical properties of lithographically structured gold wires — •Kathrin Krüger, Peter Jost, Carl Schlockermann, Philipp Merkelbach, Karl Simon Siegert, and Matthias Wuttig — RWTH Aachen University, I. Physikalisches Institut (IA), 52056 Aachen, Germany

Ongoing miniaturization in electrical devices focuses the attention on thin film effects. Over the last decade, lithographic structures became continuously smaller. Thus, new demands are placed on the interconnects, which are realized by thin and small wires.

Because of its high conductivity and thermal stability at temperatures around room temperature, gold is an important candidate as contacting material. Gold wires are often applied to the substrate by evaporation, whereas glass or silicon is often used as substrate material. To obtain a better adhesion of the gold on glass substrates, a chromium adhesion layer can be used.

Therefore, for many measurements it is important to know the electrical properties of gold. However, it is not clear whether the electrical properties, such as the specific resistance and its temperature coefficient, are still close to bulk properties at small feature sizes. Thus, in this study the dependencies of the specific resistance and its temperature coefficient of lithographically structured and thermally evaporated gold wires on thickness and width are investigated. Also, it is studied how a chromium adhesion layer affects these electrical properties.