Regensburg 2010 – scientific programme
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DS: Fachverband Dünne Schichten
DS 9: Poster: Synthesis of Nanostructured Films by Self-organization, Thermoelectric Thin Films and Nanostructures, High-k and Low-k Dielectrics, Layer Deposition Processes, Layer Growth, Layer Properties, Application of Thin Films, Surface Modification, Hard and Superhard Coatings, Metal Layers
DS 9.1: Poster
Monday, March 22, 2010, 15:00–17:30, Poster D1
Nanocomposite thin films prepared by co-sputtering and via deposition from a cluster source — •Tilo Peter1, Sven Bornholdt2, Matthias Wolter2, Thomas Strunskus1, Vladimir Zaporojtchenko1, Holger Kersten2, and Franz Faupel1 — 1Institute for Materials Science, Kiel, Germany — 2Institute of Experimental and Applied Physics , Kiel, Germany
Nanocomposites consisting of metal clusters embedded in a dielectric thin film exhibit very interesting functional properties [1]. Relying on surface diffusion during co-deposition for generating clusters may cause problems since it depends not only on the deposited material but also on the substrate. To obtain clusters independent of the substrate and with tunable size, we use a self-built cluster source that creates clusters from magnetron sputtered metal atoms. In this process the plasma parameters are controlled via a helium/argon mix. Test materials were Ag, Au and Cu.
Samples prepared by co-deposition of plasma polymerized HMDSO and metal clusters are compared to samples prepared by co-sputtering of Ag and SiO2. In-situ characterization is done by visible/uv optical emission spectroscopy. XPS is used for chemical characterization, and HRTEM serves to measure the cluster size and density distribution. In addition, visible/ uv optical emission spectroscopy is used to investigate the optical properties and plasmonic resonance of the clusters.
[1] Deposition of nanocomposites by plasmas F. Faupel, et al.
Contributions to Plasma Physics (2007), 47(7), 537-544