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DS: Fachverband Dünne Schichten
DS 9: Poster: Synthesis of Nanostructured Films by Self-organization, Thermoelectric Thin Films and Nanostructures, High-k and Low-k Dielectrics, Layer Deposition Processes, Layer Growth, Layer Properties, Application of Thin Films, Surface Modification, Hard and Superhard Coatings, Metal Layers
DS 9.2: Poster
Monday, March 22, 2010, 15:00–17:30, Poster D1
Spatially and time-resolved optical emission spectroscopy of mid-frequency pulsed PECVD — •Marcus Günther, Siegfried Peter, and Frank Richter — Institute of Physics, Chemnitz Univ. of Technol., 09107 Chemnitz, Germany
Asymmetric bipolar pulsed plasma discharges in the mid-frequency (m.f.) range are of increasing interest for the deposition of a-C:H and a-SiCN:H films. This technique is attractive for industrial applications (large area coating) but less investigated yet. Moreover, using directly coupled m.f. power supply enables to choose the substrate bias voltage independent of other process parameters.
Optical emission spectroscopy (OES) is a method to characterize electrical discharges and learn about the excited species without affecting the discharge. In m.f. PECVD, the discharge frequency is lower than the plasma frequency of electrons and even ions, so that charged particles can follow changes of the electrical field. This periodical movement of charged species in the m.f. plasma is reflected in the spatially and time-resolved optical emission spectra. The deposition of a-C:H from acetylene (C2H2) or isobutylene (C4H8), and of a-SiCN:H from trimethylsilane(3MS) nitrogen argon mixtures in 100 kHz-pulsed discharges was analysed. As one result, above the powered electrode of the m.f. discharges no clear dark space was observed. The measured time behaviour of the plasma induced emission of individual species implies different excitation mechanisms.