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DS: Fachverband Dünne Schichten
DS 9: Poster: Synthesis of Nanostructured Films by Self-organization, Thermoelectric Thin Films and Nanostructures, High-k and Low-k Dielectrics, Layer Deposition Processes, Layer Growth, Layer Properties, Application of Thin Films, Surface Modification, Hard and Superhard Coatings, Metal Layers
DS 9.3: Poster
Montag, 22. März 2010, 15:00–17:30, Poster D1
Optimizing the PECVD-process for low temperature growth of carbon nanotubes — •Kerstin Schneider1, Michael Häffner1, Boris Stamm2, Monika Fleischer1, Claus Burkhardt2, Alfred Stett2, and Dieter Kern1 — 1Institut für Angewandte Physik, Universität Tübingen — 2Naturwissenschaftliches und Medizinisches Institut an der Universität Tübingen
Carbon nanotubes (CNTs) are typically grown at temperatures above 700 °C. However in the case of many electronic and life-science applications, temperature sensitive substrates require the use of growth processes at temperatures below 400 °C. In particular for the fabrication of CNT-microelectrodes on neuro-implants flexible, temperature sensitive substrates like artificial mica and polyimide have to be used. In order to grow vertically aligned CNTs at such low temperatures, we apply plasma enhanced chemical vapor deposition (PECVD)growth techniques using optimized PECVD parameters. Optimization of these parameters includes the variation of pressure, growth time, catalyst material, catalyst thickness, and gas mixture. Quantitative results of CNT length and quality as well as optimal growth parameters for growth processes below 400 °C will be presented.