Regensburg 2010 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 9: Poster: Synthesis of Nanostructured Films by Self-organization, Thermoelectric Thin Films and Nanostructures, High-k and Low-k Dielectrics, Layer Deposition Processes, Layer Growth, Layer Properties, Application of Thin Films, Surface Modification, Hard and Superhard Coatings, Metal Layers
DS 9.42: Poster
Montag, 22. März 2010, 15:00–17:30, Poster D1
Characterization of Ion- bombardment induced modifications of periodic La/B4C-multilayer-mirrors for the reflection of soft X-ray radiation — •Fabian Merschjohann1, Maike Laß1, Lennart Gorholt1, Marc D. Sacher1, Franz Schäfers2 und Ulrich Heinzmann1 — 1Molecular and Surface Physics, Bielefeld University, D-33615 Bielefeld — 2Helmholtz-Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY II
The applicability of reflective optical components for the soft X-Ray region depends on the existence of multilayer-optics. Therefore stacks of alternating layers of two materials with different refractive index are applied. For the photon energy range of 100 - 190 eV Lanthanum (La) is favoured as the absorber material and Boroncarbide (B4C) as the spacer material. Thin periodic layer systems of those materials with double layer periods of 5.6 nm have been produced by UHV Electron Beam Evaporation. The layer thickness is controlled by in-situ X-Ray Reflectometry. The purity and the stoichiometry of the layers has been analyzed by electron beam induced in-situ Auger Spectroscopy. Ion Polishing of each interface should diminish the interface roughness and thus enhance the reflectivity. The modification of the La- and B4C-layers due to ion bombardment has been investigated by the in-situ Auger Spectroscopy, ex-situ X-Ray Diffraction and at-wavelength reflectivity measurements by use of Synchrotron radiation at the BESSY II facility. Effects of compaction, mixing, sputter-etching and smoothing have been found. The modifications can be influenced by varying the kinetic energy of the ions and/or the duration of the treatment.