Regensburg 2010 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 9: Poster: Synthesis of Nanostructured Films by Self-organization, Thermoelectric Thin Films and Nanostructures, High-k and Low-k Dielectrics, Layer Deposition Processes, Layer Growth, Layer Properties, Application of Thin Films, Surface Modification, Hard and Superhard Coatings, Metal Layers
DS 9.8: Poster
Montag, 22. März 2010, 15:00–17:30, Poster D1
Self-assembly of CF-polymer films on SiO2 (001) from first-principles calculations — •Oliver Böhm1,2, Roman Leitsmann1, Philipp Plänitz1,2, Christian Radehaus1, Michael Schreiber2, and Matthias Schaller3 — 1GWT-TUD GmbH, Material Calculations, Chemnitz, Germany — 2Institut für Physik, Technische Universität Chemnitz, 09107 Chemnitz — 3Globalfoundries Dresden Module Two GmbH & Co. KG, Germany
Polymeric materials with a low dielectric constant(low-k) are essential to the interlayer dielectrics used for the next-generation integrated circuits. However, along with the introduction of these materials a bunch of processing challenges appears. For example the contamination prevention of the material during wet and dry processing steps plays a key role in the fabrication process.
In this study we investigate the formation of thin CF-polymer films on ultra low-k (ULK) material surfaces during c-C4F8 plasma etching. In particular we use density functional theory (DFT) to study the adsorption process of different CF-polymers on SiO2 (001) surfaces, which serves as a prototypical ULK system. For different CnF2n+x molecules the most stable adsorption sides and geometries and their impact on the electronic structure will be discussed in detail.