Regensburg 2010 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 42: Focussed Session: Silicon Photonics

HL 42.2: Topical Talk

Mittwoch, 24. März 2010, 14:30–15:00, H13

3D silicon photonic crystals — •Georg von Freymann — Institut für Nanotechnologie, KIT, Karlsruhe, Germany

We report on our recent progress in the fabrication and characterization of three-dimensional silicon photonic crystals. Structures are fabricated by direct laser writing (DLW) and subsequent silicon inversion or silicon double inversion.

DLW is a very versatile technique and allows for a variety of structures ranging from woodpile photonic crystals over chiral photonic crystals to photonic quasicrystals. We will present a novel resonator design for woodpile photonic crystals and discuss future developments.