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HL: Fachverband Halbleiterphysik

HL 60: Poster II: Optical Properties, incl. Photonic Crystals and Ultrafast Phenomena

HL 60.21: Poster

Donnerstag, 25. März 2010, 18:00–20:00, Poster D1

An x-ray waveguide fabrication scheme using e-beam lithography, reactive ion etching and wafer bonding — •Henrike Neubauer¹, Mike Kanbach¹, Klaus Giewekemeyer¹, Sebastian Kalbfleisch¹, Sven Philip Krüger¹, Till-Hartmut Metzger-Kleinberg², and Tim Salditt¹ — ¹Institut für Röntgenphysik, Universität Göttingen, D-37077 Göttingen, Germany — ²European Synchrotron Radiation Facility (ESRF), 38043 Grenoble, France

Two-dimensional x-ray waveguide channels can be used as versatile optical components suitable for various applications as high resolution x-ray spectroscopy, diffraction, microscopy and holography[1,2]. We report on a second generation x-ray waveguide fabrication scheme based on e-beam lithography, reactive ion etching and Silicon wafer bonding[3], yielding waveguide channels in the relevant sub-100 nm regime. A successful holographic imaging of a suitable test pattern using hard x-ray radiation is demonstrated[4].

[1] F. Pfeiffer et al., Science 297 (2002) 230.

[2] A. Jarre et al., Phys. Rev. Lett. 94 (2005) 074801.

[3] A. Kohlstedt et al., Appl. Phys. A 91 (2008) 7-12.

[4] H. Neubauer et al., in preparation.