Regensburg 2010 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
KR: Fachverband Kristallographie
KR 10: Poster: Multiferroics (with MA, DF, KR, DS)
KR 10.56: Poster
Dienstag, 23. März 2010, 10:45–13:45, Poster A
Vector MOKE analysis on ultrathin ferromagnetic films — •Timo Kuschel1, Hauke Bardenhagen1, Robin Schubert1, Henrik Wilkens1, Daniel Bruns1, Martin Suendorf1, Bernd Zimmermann1, Florian Bertram2, and Joachim Wollschläger1 — 1Fachbereich Physik, Universität Osnabrück, Barbarastr. 7, 49069 Osnabrück, Germany — 2HASYLAB at DESY, Notkestr. 85, 22607 Hamburg, Germany
In order to study the magnetic reversal and the magnetic anisotropy of ultrathin ferromagnetic films, Fe layers of different thicknesses are assembled on MgO(001) substrates by Molecular Beam Epitaxy (MBE) under UHV conditions. The films are capped by amorphous silicon to avoid oxidation after leaving the UHV chamber. The structural characterization including X-Ray Reflectivity (XRR) and X-Ray Diffraction (XRD) measurements are performed at HASYLAB (DESY, Hamburg).
The vector MOKE analysis is based on measurements using parallel and perpendicular polarized light as well as external magnetic fields parallel and perpendicular to the incident plane of light to optain the components of the magnetization vector. A self-programmed tool is used for analyzing the magnetization curves and calculating the magnetization vector for the reversal process of different sample directions.
The results reveal a 180° reversal with a domain splitting involved for the external magnetic field parallel to one of the magnetic easy axis of the sample. The data for the magnetic hard axis show a rotation of the magnetization vector into the magnetic easy axis followed by a 90° reversal and subsequent rotation into the magnetic hard axis back.