Regensburg 2010 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 33: Poster II

MA 33.59: Poster

Freitag, 26. März 2010, 11:00–14:00, Poster B1

Resistance tuning of GMR devices via domain wall motion — •Jana Münchenberger, Patryk Krzysteczko, Günter Reiss, and Andy Thomas — Bielefeld University, Department of Thin Films and Physics of Nanostructures, Universitätsstr. 25 33615 Bielefeld

We have investigated the possibilities of adjusting the resistance of a stuctured GMR system by controlling domain wall motion. The bottom pinned GMR systems are prepared by dc sputtering through a magnetic mask and are structured via e-beam lithography after the deposition. We obtain stripes with a length of 1µm and a width of 200nm. Depending on the used GMR stack we get GMR ratios up to 6% as prepared.

In such a long spin valve structure we expect domain wall movement in the free layer and the resistance of the device depends on the domain-wall position. In a first approach we want to control the domain-wall position with an applied magnetic field while on long terms we aim to control the resistance only with current induced domain wall motion.