Regensburg 2010 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 35: Liquid and Amorphous Metals II
MM 35.3: Vortrag
Mittwoch, 24. März 2010, 12:00–12:15, H5
Thin amorphous tantalum films: Preparation and properties of samples formed by e-beam evaporators — •Kevin Stella1, Damian Bürstel1, Steffen Franzka1, Oliver Posth2, and Detlef Diesing1 — 1Institut für Physikalische Chemie, Universität Duisburg Essen — 2Institut für Experimentalphysik, Universität Duisburg Essen
Large area (A=6 cm2), thin tantalum films (5 nm < d < 100 nm ) are accomplished by evaporation from tantalum rods using small pocket e-beam evaporators. Using a sample to source distance of ≈ 20 cm, homogeneous amorphous films with a small surface roughness (<1 nm) can be prepared on glass. Films are characterized by scanning electron microscope images, atomic force microscopy, electrochemical oxidation and resistivity measurements as function of film thickness. The samples show high resistivities of 200 − 2000 µ Ω · cm . The temperature coefficient of the resistivity (TCR) is negative as characteristic for highly disordered metals.