Regensburg 2010 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 46: Nanostructured Materials III
MM 46.4: Vortrag
Donnerstag, 25. März 2010, 11:00–11:15, H16
Cluster deposition on self-assembled thiol monolayers: mechanisms from simulation and experiment — •Tommi Järvi1, Leila Costelle2, Minna Räisänen3, Jyrki Räisänen2, and Vladimir Tuboltsev2 — 1Fraunhofer-Institut für Werkstoffmechanik IWM, Freiburg, Germany — 2University of Helsinki, Helsinki, Finland — 3University of St Andrews, St Andrews, UK
Controlled deposition of clusters on surfaces is of vital importance in many applications of nanotechnology. Recently, cluster deposition on self-assembled monolayers (SAMs) of thiols on gold has raised interest, but open questions remain as to how the clusters interact with the thiol-covered surface on the atomic level.
Whether clusters immobilize, and retain their as-synthesized size distribution and properties, depends on the bonding between the cluster and gold substrate. Experiments show, that deposition energies of ca. 0.2-0.5 eV/at result in cluster penetration through the SAM [1,2]. High energies cause cluster deformation, however, and a thorough understanding of the cluster-SAM interaction at the atomic level is required so that desired properties can be achieved.
We address these questions using a combination of experiments and molecular dynamics simulations with a recently developed interatomic potential. We elucidate the physics of cluster landing, and show how the interplay between cluster-surface binding, deposition energy, and cluster size affects the structure of the deposited particles.
[1] Lando et al., Phys. Chem. Chem. Phys. 11, 1521 (2009).
[2] Costelle et al., unpublished.