Regensburg 2010 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 13: Semiconductor substrates: Adsorption
O 13.5: Vortrag
Montag, 22. März 2010, 16:00–16:15, H34
Comparison on the local adsorption of pyridine and cyclopentene on Si(100) — •Daniel Weier1,2, Tobias Lühr1, Frank Schöhnboh1,2, Axel Beimborn1, Max Brucker2, and Carsten Westphal1,2 — 1Fakultät Physik - Technische Universität Dortmund, Otto-Hahn-Str. 4, D 44221 Dortmund, Germany — 2DELTA - Technische Universität Dortmund, Maria-Goeppert-Mayer-Str. 2, D 44227 Dortmund, Germany
We investigated the chemical and geometrical properties of the systems pyridine on Si(100) and cyclopentene on Si(100) in a combined of photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) study. The experiment had been performed by applying synchrotron radiation in order to achieve a high resolution with high surface sensitivity. Our XPS and XPD results show that cyclopentene reacts with one silicon-dimer of the (2x1)-reconstructed surface in a [2+2]-cycloaddition, changing the planar molecule to a diverse tilted molecule after adsorption. The pyridine contrariwise reacts with two of the silicon dimers by a combined reaction of cycloaddition and Lewis-acid base reaction. We will provide and compare structure models for both systems including detailed structure parameters obtained within a comprehensive numerical analysis.