O 38: Semiconductor substrates: clean surfaces
Dienstag, 23. März 2010, 15:00–16:00, H40
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15:00 |
O 38.1 |
Angle-resolved low-energy photoemission at clean Si(111)(7x7) surface — •Wolfgang Heckel, Kerstin Biedermann, and Thomas Fauster
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15:15 |
O 38.2 |
SHG Spectroscopy of Si(100)(2x1) Interband Transitions — Dominic Gerlach, Björn Braunschweig, Gerhard Lilienkamp, and •Winfried Daum
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15:30 |
O 38.3 |
Cleaning of GaN(2110) surfaces by Ga deposition and desorption — •Simon Kuhr, Christian Schulz, Timo Aschenbrenner, Jan Ingo Flege, Thomas Schmidt, Detlef Hommel, and Jens Falta
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15:45 |
O 38.4 |
The role of Hydrogen for the formation of the GaP(001) surface — •Marcel Ewald, Michael Kneissl, Norbert Esser, and Patrick Vogt
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