Regensburg 2010 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 41: Poster Session I (Semiconductor Substrates: Epitaxy and growth; Semiconductor Substrates: Adsorbtion; Semiconductor Substrates: Solid-liquid interfaces; Semiconductor Substrates: Clean surfaces; Oxides and insulators: Epitaxy and growth; Oxides and insulators: Adsorption; Oxides and insulators: Clean surfaces; Organic, polymeric and biomolecular films - also with adsorbates; Organic electronics and photovoltaics, Surface chemical reactions; Heterogeneous catalysis; Phase transitions; Particles and clusters; Surface dynamics; Surface or interface magnetism; Electron and spin dynamics; Spin-Orbit Interaction at Surfaces; Electronic structure; Nanotribology; Solid/liquid interfaces; Graphene; Others)

O 41.87: Poster

Dienstag, 23. März 2010, 18:30–21:00, Poster B1

(SP)VLEED: A spin-polarized very-low-energy electron-diffraction experiment — •Kathrin Wulff, Ulrich Burgbacher, Anke B. Schmidt, and Markus Donath — Physikalisches Institut, Westfälische Wilhelms-Universität Münster, 48149 Münster

This poster has been withdrawn.