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O: Fachverband Oberflächenphysik
O 71: Metal substrates: Epitaxy and growth
O 71.7: Talk
Thursday, March 25, 2010, 16:30–16:45, H31
Pulsed-laser deposition of Cu on Cu(001) - the crucial role of particle mobility and flux — •Andreas Dobler and Thomas Fauster — Lehrstuhl für Festkörperphysik, Universität Erlangen-Nürnberg, Staudtstr. 7, 91058 Erlangen
Pulsed-laser deposition (PLD) provides for some µ s up to 105 times higher particle flux than thermal deposition (TD). For homoepitaxial submonolayer growth, nucleation theory predicts island densities on the substrate scaling with a power law of flux F over the temperature-dependent diffusion coefficient D. Thus, significantly higher island densities are expected for PLD than for TD.
At 300 K, we found identical island densities for PLD and TD which were measured by scanning tunneling microscopy. Systematic variation of D (temperatures from 150 to 300 K) and F shows that this unexpected behavior is limited to low F/D values. At high F/D, the island density created by PLD is significantly higher than by TD. Nucleation is modeled by numerical integration of rate equations to explain this behavior.