Regensburg 2010 – scientific programme
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O: Fachverband Oberflächenphysik
O 74: Nanostructures at surfaces: Other
O 74.3: Talk
Thursday, March 25, 2010, 15:30–15:45, H34
Local Surface Activation of SiOx by a Focused Electron Beam as a Means for Nanoscale Lithography — •Florian Vollnhals, Marie-Madeleine Walz, Michael Schirmer, Thomas Lukasczyk, Hans-Peter Steinrück, and Hubertus Marbach — Lehrstuhl für Physikalische Chemie II and Interdisciplinary Center for Molecular Materials (ICMM), Friedrich-Alexander- University Erlangen-Nuremberg, Egerlandstr. 3, 91058 Erlangen
The fabrication of arbitrarily shaped nanostructures is of key interest for industrial applications as well as for scientific research. Suitable fabrication techniques include resist-based and resist-free techniques, e.g. electron beam induced deposition (EBID).
In EBID, a precursor gas adsorbs on a substrate and is decomposed locally by a focused electron beam. Non-volatile fragments then form a deposit on the surface. It was shown that this process can yield almost pure Fe deposits (95%) from Fe(CO)5 under UHV conditions [1].
Our recent results expand the EBID concept. If the focused electron beam is used to locally irradiate a thin (300nm, commercial) or an ultra thin (few nm) SiOx layer on Si(100) without offering any precursor gas, the exposed areas can later be ”developed” by dosing Fe(CO)5. The resulting formation of Fe deposits is attributed to electron induced activation of the surface and enhanced by autocatalytic growth of iron in the presence of Fe(CO)5.
This work was supported by the DFG through grant MA 4246/1-1.
[1] T. Lukasczyk et al., Small, 4 (6) (2008) 841