Regensburg 2010 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 87: Methods: Other (experimental)
O 87.3: Vortrag
Freitag, 26. März 2010, 11:45–12:00, H42
A fast, full multichannel reflectance difference spectrometer — •Chunguang Hu1,2, Lidong Sun1, Michael Hohage1, and Peter Zeppenfeld1 — 1Institut für Experimentalphysik, Johannes-Kepler-Universität Linz, Austria — 2State Key Lab of Precision Measuring Technology and Instruments, Tianjin University, China
With its high surface sensitivity, reflectance difference spectroscopy (RDS) has been proven to be a versatile tool for the scientific research in surface science and thin film growth. We report the development of a fast, multiwavelength RD spectrometer using a rotating compensator (RC) for signal modulation. The new spectrometer measures the optical anisotropy in the entire spectral range from 1.5 to >4.5eV simultaneously using a photodiode array with 1024 channels as detector. We will demonstrate that the new RDS is particularly suitable for in-situ monitoring of thin film growth and other surface processes by illustrating its application in the research of organic thin film growth.