Regensburg 2010 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

TT: Fachverband Tiefe Temperaturen

TT 9: SC: Poster Session

TT 9.13: Poster

Monday, March 22, 2010, 14:00–18:00, Poster A

Fabrication of MgB₂ thin films by co-sputtering — •Savio Fabretti, Patrick Thomas, Günter Reiss, and Andy Thomas — Thin Films and Physics of Nanostructures, Bielefeld University, Bielefeld, Germany

MgB₂ is an intermetallic compound with a high critical temperature of T_c=40K. The simple cristall structure, large coherence lengh and the high critical current density makes thin magnesium diboride films attractive for superconducting applications like Josephson junctions. To fabricate thin MgB₂ films, we used a magnetron co-sputtering system with a Mg and a B target respectively. The films were deposited by dc-magnetron sputtering of Mg and rf-magnetron sputtering of B at a low substrate temperature between 210^∘C and 260^∘C without a post annealing process. The differences in vacuum pressure between Mg and B make it essential that the composition ratio is controlled by different sputtering power of each target. The crystal structure was measured by X-ray diffraction and transport investigations at low temperatures were performed.