Dresden 2011 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 23: Poster: Semicrystalline Polymers, Polymer Crystallization and Self-Assembly

CPP 23.7: Poster

Dienstag, 15. März 2011, 18:00–20:00, P2

Polymer Blend Lithography: A Method to Generate Monolayer Templates for the Self-Assembled Growth of ZnO Nanostructures — •Jiehong Jin¹, Armin Müller¹, Svetlana Khasminskaya¹, Cheng Huang¹, Jorg Pfeifer¹, Luciana Pitta Bauermann^3,4, Peter Gerstel^3,4, Joachim Bill^{3, 4}, Stefan Walheim^{1, 2}, and Thomas Schimmel^{1, 2} — ¹Karlsruhe Institute of Technology (KIT), Institute for Nanotechnology (INT), Karlsruhe, Germany — ²Karlsruhe Institute of Technology (KIT), Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe — ³Institute for Materials Science, Universität Stuttgart, Germany — ⁴Max-Planck-Institute for Metals Research, Stuttgart

A wet-chemical process near room temperature allowing the large-area deposition of nanostructured ZnO films would be attractive for device fabrication. Our approach is 1) to generate a monolayer template on which 2) a nanostructured ZnO layer is assembled. Polymer phase separation during spin coating of a polymer blend is used to generate a purely lateral phase morphology. The selective dissolution of one polymer (Polystyrene) leaves back a polymer mask (PMMA) with holes showing sharp edges. The diameter of the holes depends on the humidity, the molecular weight and film thickness and can therefore be adjusted in the range between 100 nm and several microns. We use these perforated polymer films as lift-off masks for the deposition of self-assembled silane monolayers. The remaining 2-nm-thick pattern can be used as template for the wet-chemical assembly of large-area ZnO nanostructures with thickness of about 50 nm.