Dresden 2011 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 35: Poster: Micro- and Nanofluidics

CPP 35.11: Poster

Wednesday, March 16, 2011, 17:00–19:00, P2

Wetting behavior of Si surfaces decorated with well-defined nanopillars — •Stefan Wiedemann, Alfred Plettl, Paul Ziemann, and Kay Egloff — Institute of Solid State Physics, Ulm University

To influence the wetting behavior of Si surfaces, hexagonally ordered arrays of nanoparticles were prepared in a first step by micellar or colloidal techniques combined with photoseeding. These particles are used as etching masks during a subsequent reactive ion etching step resulting in correspondingly ordered arrays of nanopillars. This approach allows a systematic variation of the height (<180 nm), density and diameter (10 to 150 nm) of the pillars. After removing the residual etching mask, hydrophobicity of the samples was additionaly modified by coating with OTMS (Octadecyltrimethoxysilane) or a plasmadeposited fluorcarbonfilm. Such surfaces were characterized by SEM and AFM and their wetting behavior was studied by measuring advancing, static and receding contact angles of water droplets. Additionally, dewing was investigated on these nanostructures.