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DF: Fachverband Dielektrische Festkörper
DF 18: Applications of dielectric solids
Donnerstag, 17. März 2011, 16:00–17:20, MÜL Elch
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16:00 | DF 18.1 | Nanometer thin tantalum oxide capacitors: Characterization of temperature stability and built in electric fields. — •Katrin Bruder, Kevin Stella, and Detlef Diesing |
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16:20 | DF 18.2 | Colossal Dielectric Constants in Transition-Metal Oxides — •Stephan Krohns, Peter Lunkenheimer, and Alois Loidl |
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16:40 | DF 18.3 | CVD Diamond for sub-mm and THz applications — •Theo Scherer, Dirk Strauss, and Andreas Meier |
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17:00 | DF 18.4 | Glass-ceramics with paraelectric phases for mobile applications in the GHz-range — •Hubertus Braun, Martin Letz, and Gerhard Jakob |