Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 10: Thin Film Characterisation: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS, ...) III

DS 10.2: Vortrag

Montag, 14. März 2011, 14:15–14:30, GER 38

Establishment of a structure zone model for the growth of reactively sputtered Titania thin films — •Azza Amin, Dominik Köhl, and Matthias Wuttig — I. Institute of Physics (IA), RWTH Aachen University, 52056 Aachen, Germany

TiO₂ thin films are applied in a wide range of applications e.g. in self-cleaning, antibacterial, antifogging or optical coatings. The physical properties exploited in these applications strongly depend on the crystal structure of the films. Crystalline TiO₂ thin films typically exhibit an anatase or a rutile phase. Therefore, it is desirable to develop a thorough understanding of the structure formation. This would allow it to tailor the film structure with the aim to improve the desired properties needed for a targeted application. Therefore, the structural evolution during growth of reactively sputtered TiO₂ films has been comprehensively investigated as a function of various parameters comprising oxygen partial pressure, energetic ion bombardment, target age and substrate temperature. Pronounced correlations have been found between the deposition conditions, the film thickness, the crystal structure and the morphology of the films. These correlations have been summarized in a structure zone model that explicitly links the basic characteristics of the deposition process with the properties of the films fabricated.