DS 16: Plasmonics and Nanophotonics O-II (jointly with HL and O)
Monday, March 14, 2011, 17:15–19:15, PHY C213
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17:15 |
DS 16.1 |
Lithographically defined plasmonic waveguides on semiconductors for on-chip quantum optics applications — •Gregor Bracher, Konrad Schraml, Benedikt Mayer, Birgit Wiedemann, Simon Frédéric, Jonathan J. Finley, and Michael Kaniber
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17:30 |
DS 16.2 |
Fabrication of high-quality large-area plasmonic oligomers — •Jun Zhao, Bettina Frank, and Harald Giessen
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17:45 |
DS 16.3 |
Plasmonic nanostructures for strong light confinement fabricated using soft-lithography and plasma etching techniques — •Manuel Gonçalves, Tobias Paust, Fabian Enderle, Stefan Wiedemann, Alfred Plettl, Paul Ziemann, and Othmar Marti
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18:00 |
DS 16.4 |
Light Localization Effects in Commensurate Gratings — •Aude Barbara, Jerôme Le Perchec, Stéphane Collin, Camille Maxime, and Pascal Quémerais
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18:15 |
DS 16.5 |
Parallel nanostructuring of fused silica exploiting local near fields — •Sören Maag, Rodica Morarescu, Frank Träger, and Frank Hubenthal
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18:30 |
DS 16.6 |
Mapping infrared antenna resonances of particle arrays fabricated by nanosphere lithography — •Jens Richter, Andrea Hartung, Jón Mattis Hoffmann, Xinghui Yin, and Thomas Taubner
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18:45 |
DS 16.7 |
Plasmonic oligomers: the role of individual particles on collective behavior — •Mario Hentschel, Na Liu, and Harald Giessen
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19:00 |
DS 16.8 |
Fabrication of nanocone arrays for high sensitivity biosensing — •Monika Fleischer, Christian Schäfer, Andreas Horrer, Katharina Broch, Dominik Gollmer, Frank Schreiber, and Dieter P. Kern
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