Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 18: Progress in Micro- and Nanopatterning: Techniques and Applications I (Focused Session, jointly with O -- Organisers: Graaf, Hartmann)

DS 18.3: Topical Talk

Dienstag, 15. März 2011, 12:00–12:30, GER 37

Electrochemical Oxidation and Anodization Lithography on Self-Assembled Monolayers — •Stephanie Hoeppener — Laboratory of Organic and Macromolecular Chemistry, Friedrich-Schiller-University Jena, Germany

The use of Scanning Probe Based lithography techniques dates back shortly after the introduction of SXM techniques. In particular bias mediated chemical oxidation processes can be used to induce changes in the substrate's properties, i.e., the conductivity, topography, etc.

Implementing the bias mediated electrochemical oxidation onto self-assembled monolayers was introduced as an alternative that permits the fabrication of surfaces bearing addressable chemically active functional groups. The research activities in this field will be highlighted.

In particular the fabrication of chemically heterogeneous nanostructures introduces the possibility for a site-selective fictionalization of nanostructures -- a challenge which is difficult to establish by common photo- and electron lithographic structuring approaches. Besides of fundamental investigations of the electrochemical oxidation process, illustrative examples of the oxidation pattern modification will be presented with respect to nanofabrication approaches.