Dresden 2011 – scientific programme

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DS: Fachverband Dünne Schichten

DS 34: Progress in Micro- and Nanopatterning: Techniques and Applications III (Focused Session, jointly with O -- Organisers: Graaf, Hartmann)

DS 34.4: Talk

Wednesday, March 16, 2011, 15:45–16:00, GER 38

Photothermally induced chemical patterning of organic monolayers on oxide-free silicon substrates — •Martin Przyklenk¹, Benjamin Klingebiel¹, Luc Scheres², Han Zuilhof², and Nils Hartmann¹ — ¹Fakultät für Chemie, CeNIDE, NETZ, Universität Duisburg-Essen, Universitätsstr. 5, 45141 Essen — ²Laboratory of Organic Chemistry, Wageningen University, Dreijenplein 8, 6703 HB Wageningen, The Netherlands

Patterned self-assembeld organic monolayers (SAMs) are widely used as templates to build up complex functional surface structures. A simple routine for nanopattering of organic monolayers down to 100 nm and below relies on photothermal processes [1,2]. In photothermal processing a focused laser beam is used to locally heat the substrate and initiate thermal decomposition of the monolayer. Here we use a simple photothermal procedure for direct chemical functionalization of organic monolayers [1]. Oxide-free silicon samples are coated with alkyl and alkenyl monolayers [2]. Through irradiation with a focused beam of an argon ion laser at a wavelength of 514 nm in gaseous bromine local bromination of the monolayer takes place. Mechanistic aspects and prospects of photothermal routines in micro- and nanofabrication of multifunctional organic monolayers are discussed.

[1] B. Klingebiel, A. Schröter, S. Franzka, N. Hartmann, ChemPhysChem 10 (2009) 2000.

[2] L. Scheres, B. Klingebiel, J. ter Maat, M. Giesbers, H. de Jong, N. Hartmann, H. Zuilhof, Small 6 (2010) 1918.