Dresden 2011 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films
DS 42.120: Poster
Mittwoch, 16. März 2011, 15:00–17:30, P1
Fabrication of diffractive XUV optics and plasmonic nanostructures by e-beam lithography — •Christian Späth1, David Kronmüller1, Jürgen Schmidt1, Soo Hoon Chew1, Michael Hofstetter2, Alexander Guggenmos2, Mihael Kranjec1, and Ulf Kleineberg1,2 — 1Fakultät für Physik, Ludwig-Maximilians-Universität München, 85748 Garching, Germany — 2Max-Planck-Institut für Quantenoptik, 85748 Garching, Germany
E-beam lithography is one of the premier choices for fabricating artificial structures on the nanometer scale and is widely used in the field of electronics and nanophotonics. We are reporting about our latest results in the development of diffractive nanostructures for sub-μm focusing of coherent XUV high harmonic radiation at around 95 eV photon energy. Zone Plate patterns (D=120 μm, N = 120) have been written in PMMA and HSQ resist on Si(100) wafer and have subsequently been coated with a Mo/Si multilayer resulting in a reflective nanofocusing device. These structures have been characterized by means of atomic force and scanning electron microscopy. Furthermore bow-tie nanostructures for local near field enhancement of ultrashort femtosecond laser pulses have been fabricated in PMMA and were transferred in 30 nm Ag by Lift-Off. These silver nanostructures were investigated by AFM as well as 1P-PEEM and 2P-PEEM.