Dresden 2011 – scientific programme

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DS: Fachverband Dünne Schichten

DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films

DS 42.5: Poster

Wednesday, March 16, 2011, 15:00–17:30, P1

Influence of process and system parameters on the local oxidation of alkyl-terminated silicon — •Thomas Baumgärtel, Harald Graaf, and Christian von Borczyskowski — Center for Nanostructured Materials and Analytics, Institut für Physik, TU Chemnitz, 09107 Chemnitz, Germany

The local anodic oxidation (LAO) of silicon substrates by an atomic force microscope (AFM) is an electrochemical process which is influenced by multiple parameters. These can be divided into two major groups: system parameters and process parameters. Process parameters such as oxidation voltage, duration and ambient humidity can be tuned over a wide range of values during the experiment. System parameters on the other hand depend on equipment and materials themselves and are only difficult to control e.g. AFM tip shape, substrate conductivity and surface hydrophobicity. We investigated the influence of these parameters on the LAO process of silicon which is passivated by a self-assembled alkyl monolayer. Such monolayers are not only characterized by high molecular order and an excellent physical and chemical stability but offer also a neat way to tune the surface properties by variation of the head groups of the alkenes. A detailed understanding of the dependencies of the LAO process is essential for the controlled generation of silicon oxide nanostructures which can be used to build up functional nanostructures by a combined bottom-up (anchoring of functional molecules) and top-down (AFM LAO lithography) approach.